Wet Station

We have 3 solutions for variety of substrates.

Spin Processor (MSP-1)

This spin processor is suitable for R&D and small production.
All processes from chemical process to dryer are in one cup.

Our system has batch type cleaning ,resist stripping and etching potions.
All processes from chemical cleaning to dryer are fully automated.

Multi spin processor is suitable for mass production and Multi complex process.

Function	Spin unit	Function unit	Option
Resist strip	Organic solvent unit	Spin chuck sensor	Electrical conductivity control system
Mask blanks	Ultrasonic cleaning Air mist nozzles cleaning	UV lamp cleaning Chemical bath Beveled edge scrub Surface scrub Back surface Bake	Traceability system
Post-CMP cleaner	Chemical CUP Ultrasonic cleaning Air mist nozzles cleaning	Underwater loader Both side scrub N₂ ion blow
Light emitting diode	Brush scrub Ultrasonic cleaning	N₂ ion blow	Chemical supply system
SiC wafer cleaning	Brush scrub Surface active agent Acid cleaning Alkali cleaning	Beveled edge scrub Wafer reversing mechanism	Chemical supply system
Spin etcher	Chemical CUP Ultrasonic cleaning De-ionized water rinse	N₂N2 ion blow	Chemical supply system Chemical recycling system