Photomask Repair System MR8000
This FPD photomask defect repair system uses focused ion beam (FIB) technology and supports large scale photomasks.
A rotation mechanism inside the chamber minimizes an installation area.
Features
-
Supports large flat panel dispray masks
Can take large photomasks up to a maximum size of 1400×1600 mm. -
Can deposit high adhesion film Can form film
with adhesion strength comparable to Cr film on the mask using a special gas. -
Can repair gray tone masks
FIB carbon deposition function allows repair of clear defects in gray-tone masks that use half-tone films.
Specifications
| Mask sizes | Max: 1400×1600 mm Min: 6-inch Max thickness: 15 mm Min thickness: 5 mm |
|---|---|
| Repair accuracy | 50 nm@3σ |
| Clear defect repair method | FIB carbon deposition |
| Opaque defect repair method | Gas-assisted etching |
