Materials Science

The SU9000 achieved the world’s highest resolution^＊1 of 0.4 nm at 30 kV accelerating voltage through a large number of fundamental performance enhancements including a high-brightness electron gun and a low-aberration lens.
Now, Hitachi High-Tech announces the SU9000II, which can achieve a resolution of 0.7 nm even at 1.0 kV landing voltage (with deceleration feature option).
To allow for stable data acquisition at the instrument‘s highest performance levels, the SU9000II offers new capabilities that render automated adjustments of the optical system—and the new EM Flow Creator software package as an option to render automated data acquisition, particularlysequential data collection.

The SU8700 brings in a new era of ultrahigh-resolution Schottky field emission scanning electron microscopes to the long-standing Hitachi EM line-up. This revolutionary FE-SEM platform incorporates multifaceted imaging, high-probe current, automation, efficient workflows for users of all experience levels, and more.

The SU8600 brings in a new era of ultrahigh-resolution cold-field emission scanning electron microscopes to the long-standing Hitachi EM line-up. This revolutionary CFE-SEM platform incorporates multifaceted imaging, automation, increased system stability, efficient workflows for users of all experience levels, and more.

The SU7000 is designed to allow simultaneous acquisition of multiple secondary and backscattered electron signals, and enables rapid capture of many types of signals. With the ability to display and store up to 6 signal channels simultaneously, the SU7000 offers unsurpassed imaging performance. In addition, it provides a flexible of specimen chamber and vacuum system to support the broad range of observational conditions. Moreover, the electron gun—with its built-in Schottky emitter—can provide irradiating beam currents of up to 200 nA. The SU7000 is built to accommodate the full diversification of future analytical methods.

SU5000 combines Schottky emission electron source and out-lens objective lens for high resolution imaging and diverse analyses of samples with various sizes and compositions. Its drawer type stage allows applications with special stages such as heating, tensile, and so on. Unique user interface, EM Wizard supports best SEM experience of every user.

Hitachi High-Tech's scanning electron microscopes SU3800/SU3900 deliver both operability and expandability. The operator can automate many operations and efficiently utilize their high performance. The SU3900 is equipped with a large multipurpose specimen chamber to accommodate observation of large samples.

FlexSEM 1000 employs thermionic electron source and achieves resolution of 4.0nm with its compact design ready for desktop setup. Low vacuum mode allows rapid observation of insufficiently conductive samples without metal coating to prevent charging. Optional Ultra Variable pressure Detector (UVD) enhance surface imaging capability of samples under low vacuum environment.

Hitachi's unique 200 kV aberration-corrected TEM/STEM: the perfect harmony of imaging resolution and analytical performance
0.078 nm spatial resolution in STEM is achieved together with high specimen-tilt capability and large solid angle EDX detector(s), all in a single objective lens configuration.
The HF5000 builds on features from Hitachi HD-2700 dedicated STEM including Hitachi's own fully automated aberration corrector, symmetrical dual SDD EDX and Cs-corrected SE imaging. It also incorporates the advanced TEM/STEM technologies developed in the HF series.
Integrating these accumulated technologies into a new 200 kV TEM/STEM platform results in an instrument with an optimum combination of sub-Å imaging and analysis, as well as the flexibility and unique capabilities to address the most advanced studies.

HT7800 series are 120kV digital TEM with enhanced operability. High-resolution screen camera and Image Navigation function ensure comfortable digital operation in a lighted environment. HT7800 offers wide-area, high-contrast imaging while HT7830 realizes best-in-class resolution.

SEM column and FIB column are orthogonally arranged to optimize column layout for 3D structural analysis. FE electron source and its unique detection geometry enable high resolution SEM imaging at beam coincident point. 3D-EDS and 3D-EBSD can be performed without moving the stage. Employing micro-sampling and triple beam system, high quality samples can be prepared for TEM and atom probe.

NX2000 was developed towards the ultimate TEM sample preparation system. FE electron source and high-sensitivity detection system allow high-contrast, real-time end point detection. Sample orientation control technology and Ar/Xe triple beam system enable significant reduction of artefacts and damage during sample preparation. With auto micro-sampling function, the throughput of TEM sample preparation can be drastically improved.

The Hitachi Ethos FIB-SEM incorporates the latest-generation FE-SEM with superb beam brightness and stability. Ethos delivers high-resolution imaging at low voltages combined with ion optics for nanoscale precision processing.

The Hitachi research-grade AFM5300E offers significantly improved sensitivity, accuracy, and resolution of electromagnetic property measurements operated under high-vacuum conditions. Furthermore, it establishes a benchmark for comprehensive environmental control and is the only tool on the market affording AFM imaging in air/liquid/vacuum, a broad temperature range (-120 °C to 800 °C), magnetic field or humidity controls, as well as correlated AFM/SEM/ion milling investigations.

The AFM5500M is an AFM platform equipped with a fully addressable 4-inch stage, optimized for medium-sized samples.

ArBlade 5000 supports both cross-section milling and flat milling to prepare samples depending on the purpose. Cross section width can be expanded to 8mm for applications requiring wide area milling such as electric components.