Multi batch type wet station
![Batch Type Wet Station](/id/en/media/batch_main_jpg_tcm39-25634.jpg)
Our system has batch type cleaning ,resist stripping and etching potions.
All processes from chemical cleaning to dryer are fully automated.
Configuration
![-](/id/en/media/hsl_ind_man_wet_001_jpg_tcm39-25635.jpg)
Features
- All processes from chemical cleaning to dryer are fully automated.
- Carrier transfer and carrier loess transfer is selectable
- You can configure for your application.
- Layout is In-line type and through-the –wall type.
- Si wafer, glass substrate, compound wafer and so on is applied.
- Round wafer and square wafer is applied
- Dry method is selectable, spin dryer ,IPA vapor dryer and hot blower.
- inorganic acid inorganic alkali organic acid organic alkali function water can be use
- You can choose many option ultrasonic cleaning rocking mechanism reversing mechanism
Example
![](/products/images/12333/batch_03.jpg)
![](/products/images/12333/batch_04.jpg)
![](/products/images/12333/batch_05.jpg)
![](/products/images/12333/batch_06.jpg)
![](/products/images/12333/batch_07.jpg)
![](/products/images/12333/batch_08.jpg)
![](/products/images/12333/batch_09.jpg)
![](/products/images/12333/batch_10.jpg)