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参考文献・発表リスト

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2019年

  • Focused ion beam system equipped with gas field ion source for industrial application

    • Anto Yasaka, F. Aramaki, T. Kozakai, O. Matsuda, K. Shiina and Y. Kawanami
    The 22nd International Conference on Secondary Ion Mass Spectrometry (SIMS-22), Kyoto, Japan, 2019, 25-3-I1

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2017年

  • Mask Repair Technology Using Gas Field Ion Source

    • Anto Yasaka, Fumio Aramaki, Tomokazu Kozakai, Osamu Matsuda, Kensuke Shiina, Koji Nagahara
    2017 MRS Fall Meeting & Exhibit, Boston, Massachusetts, TC03.11.01

  • Mask Repair Technology using Gas Field Ion Source

    • Anto Yasaka, Fumio Aramaki, Tomokazu Kozakai, Osamu Matsuda
    第64回春季応用物理学会学術講演会講演予稿集,E16p-315-3 (2017)

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2016年

  • Mask Repair Technology using Gas Field Ion Source

    • A. Yasaka, F. Aramaki, T. Kozakai, O. Matsuda
    AVS 63rd International Symposium & Exhibition HI+MI+NS-ThA-1

  • Nanoscale Imaging and Fabricatin by Focused Ion Beam System Equipped with Gas Field Ion SourceNanoscale Imaging and Fabrication by Focused Ion Beam System Equipped with Gas Field Ion Source

    • T. Kozakai, O. Matsuda
    The 29th International Microprocesses and Nanotechnology Conference (MNC2016), Kyoto, Japan, 9C-2-1

  • Nanoscale Imaging, Material Removal and Deposition for Fabrication of Cutting-edge Semiconductor Devices

    • Anto Yasaka, Fumio Aramaki, Tomokazu Kozakai, Osamu Matsuda
    Hitachi Review, Vol.65 No.7

  • ナノレベルの「見る」，「削る」，「付ける」技術で 最先端半導体デバイス製造に貢献する -イオンビームによるフォトマスク欠陥修正技術-

    • 八坂行人、荒巻文朗、小堺智一、松田修
    日立評論2016年5月号

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2015年

  • Photomask repair technology by using gas field ion source

    • A. Yasaka, F. Aramaki, T. Kozakai, O. Matsuda, K. Shiina, H. Oba, Y. Sugiyama, K. Aita, and M. Muramatsu
    Gas Ion Microscopy Workshop 2015, Trinity College, Dublin, Ireland

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2014年

  • Performance of GFIS mask repair　system for various mask materials

    • Fumio Aramaki, Tomokazu Kozakai, Osamu Matsuda, Anto Yasaka, Hitachi High-Tech Science Corporation, 36-1 Takenoshita, Oyama-cho, Sunto-gun,Shizuoka 410-1393, Japan
    Shingo Yoshikawa, Koichi Kanno, Hiroyuki Miyashita, Naoya Hayashi, Dai Nippon Printing Co., Ltd., 2-2-1 Fukuoka, Fujimino-shi, Saitama 356-8507, Japan, Performance of GFIS mask repair　system for various mask materials, Proc. SPIE 9235, Photomask Technology 2014, 92350F (October 21, 2014),

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2012年

  • Photomask Repair Technology by using Gas Field Ion Source

    • F.Aramaki, T.Kozakai, O.Matsuda, O.Takaoka, Y.Sugiyama, H.Oba, K.Aita, A.Yasaka, Photomask Repair Technology by using Gas Field Ion Source, Photomask Japan 2012

  • Repair Technology for Large Scale Photomasks

    • F.Aramaki, T.Kozakai, Y.Nakagawa, Y.Koyama, M.Aso, H.Momota, H.Takiguchi, M.Okabe, M.Muramatsu, Repair Technology for Large Scale Photomasks, Photomask Japan 2012

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2011年

  • EUVLマスク修正のための新しいFIB技術の開発

    • 荒巻文朗、松田修、小堺智一、大庭弘、杉山安彦、八坂行人、天野剛、茂村弘之、須賀治, EUVLマスク修正のための新しいFIB技術の開発, NGLワークショップ2011

  • Development of new FIB technology for EUVL mask repair

    • F.Aramaki, T.Ogawa, O.Matsuda, T.Kozakai, Y.Sugiyama, H.Oba, A.Yasaka, T.Amano, H.Shigemura, O.Suga, Development of new FIB technology for EUVL mask repair, SPIE Advanced Lithography 2011

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2010年

  • Nanotweezers for removing nanoparticles on EUVL masks

    • F.Aramaki, T.Umemoto, M.Yasutake, H.Shigemura, O.Suga, Nanotweezers for removing nanoparticles on EUVL masks, International Symposium on Extreme Ultraviolet Lithography

  • Reflective multi-layer etching for repairing clear defect on EUV masks using FIB

    • T.Amano, H.Shigemura, N.Takagi, T.Terasawa, O.Suga, T.Kozakai, F.Aramaki, A.Yasaka, Y. Inazuki, N.Hayashi, Reflective multi-layer etching for repairing clear defect on EUV masks using FIB, International Symposium on Extreme Ultraviolet Lithography

  • Study of EUV mask defect repair using FIB method

    • T.Amano, N.Takagi, H.Shigemura, T.Terasawa, O.Suga, K.Shiina, F.Aramaki, A.Yasaka, Y. Inazuki, N.Hayashi, Study of EUV mask defect repair using FIB method, Photomask Technology 2010

  • FIB-CVD technology for EUV mask repair

    • Tsuyoshi Amano, Noriaki Takagi, Hiroyuki Shigemura, Tsuneo Terasawa, Osamu Suga, Kensuke Shiina, Fumio Aramaki, Tomokazu Kozakai, Osamu Matsuda, Anto Yasaka, FIB-CVD technology for EUV mask repair, Photomask Japan 2010

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2009年

  • Nanotweezers as a particle removal tool for EUVL masks

    • Takeshi Umemoto, Masatoshi Yasutake, Fumio Aramaki, Hiroyuki Shigemura, Osamu Suga, Nanotweezers as a particle removal tool for EUVL masks, Photomask Japan 2009

  • FIB mask repair technology for EUV mask

    • Tsuyoshi Amano, Yasushi Nishiyama, Hiroyuki Shigemura, Tsuneo Terasawa, Osamu Suga, Kensuke Shiina, Fumio Aramaki, Anto Yasaka, Tsukasa Abe, Hiroshi Mohri, FIB mask repair technology for EUV mask, Photomask Japan 2009

  • ナノピンセット：EUVLへの応用

    • 梅基 毅、安武 正敏、荒巻 文朗、"ナノピンセット：EUVLへの応用", クリーンテクノロジー(日本工業出版), 12月号(2009)

  • Removal Method of Nano-Cut Debris for Photomask Repair Using an Atomic Force Microscopy System

    • Futoshi Iwata, Kazutaka Saigo, Toshihiko Asao, Masatoshi Yasutake, Osamu Takaoka, Takuya Nakaue, Shuichi Kikuchi, "Removal Method of Nano-Cut Debris for Photomask Repair Using an Atomic Force Microscopy System", Japanese Journal of Applied Physics 48 (2009)

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2008年

  • Ga implantation and interlayer mixing during FIB repair of EUV mask defects

    • Yasushi Nishiyama; Tsuyoshi Amano; Hiroyuki Shigemura; Tsuneo Terasawa; Osamu Suga; Tomokazu Kozakai; Fumio Aramaki; Kensuke Shiina; Anto Yasaka; Ryoji Hagiwara, Ga implantation and interlayer mixing during FIB repair of EUV mask defects, Photomask Technology 2008

  • Study of EUVL mask defect repair using FIB-GAE method

    • Tsuyoshi Amano; Yasushi Nishiyama; Hiroyuki Shigemura; Tsuneo Terasawa; Osamu Suga; Kensuke Shiina; Fumio Aramaki; Ryoji Hagiwara; Anto Yasaka, Study of EUVL mask defect repair using FIB-GAE method, Photomask Technology 2008

  • EUVLマスク欠陥のFIB-GAE修正プロセス開発

    • 天野剛、西山泰史、茂村弘之、寺澤恒男、須賀治、椎名健介、荒巻文朗、八坂行人, EUVLマスク欠陥のFIB-GAE修正プロセス開発, NGLワークショップ2008

  • Damage analysis of EUV mask under Ga focused ion beam irradiation

    • Yasushi Nishiyama; Tsuyoshi Amano; Hiroyuki Shigemura; Tsuneo Terasawa; Osamu Suga; Tomokazu Kozakai; Syuichi Kikuchi; Kensuke Shiina; Anto Yasaka; Ryoji Hagiwara, Damage analysis of EUV mask under Ga focused ion beam irradiation, Photomask Japan 2008

  • Evaluation of defect repair of EUVL mask pattern using FIB-GAE method

    • Tsuyoshi Amano; Yasushi Nishiyama; Hiroyuki Shigemura; Tsuneo Terasawa; Osamu Suga; Ryoji Hagiwara; Kensuke Shiina; Shuichi Kikuchi; Anto Yasaka, Evaluation of defect repair of EUVL mask pattern using FIB-GAE method, Photomask Japan 2008

  • 自己検知型カンチレバーを用いた液中ＡＦＭ観察法\

    • 西郷和隆, 石川恒志, 中上卓哉, 高岡修, 安武正敏, 菊池修一, 牛木辰男, 岩田　太, 自己検知型カンチレバーを用いた液中ＡＦＭ観察法, 春季第55回応用物理学関係連合講演会

  • Advanced Photomask Defect Repairing Technology Using FIB and SPM

    • O. Takaoka, “Advanced Photomask Defect Repairing Technology Using FIB and SPM”, Int. J. of Automation Technology, Vol.2, pp66-69(2008)

  • 45nmノード対応フォトマスク欠陥修正装置

    • 萩原良二, 高岡修 "45nmノード対応フォトマスク欠陥修正装置", 電子材料（工業調査会）,3月号（2008）

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2007年

  • 高精度微細加工用AFMカンチレバーの開発

    • 中上卓哉, 高岡修, 浜尾尚範, 渡邉将史, 安武正敏, 渡邉直哉, 白川部喜春，八坂行人, 高精度微細加工用ＡＦＭカンチレバーの開発, 秋季第68回応用物理学会学術講演会

  • ナノ加工粉除去装置の開発とAFMナノ振動切削プロセスにおける効果

    • 西郷和隆,浅尾 俊彦, 岩田 太, 佐々木 彰, 中上 卓哉, 安武 正敏, 高岡 修, 菊池 修一, ナノ加工粉除去装置の開発とAFMナノ振動切削プロセスにおける効果, 精密工学会秋季大会学術講演会

  • AFMナノスケール振動切削を用いたフォトマスクリペア技術の開発

    • 浅尾 俊彦, 瀬田 翔平, 岩田 太, 佐々木 彰, 中上 卓哉, 安武 正敏, 高岡 修, 菊池 修一, AFMナノスケール振動切削を用いたフォトマスクリペア技術の開発, 精密工学会春季大会学術講演会

  • A semi-automated AFM photomask repair process for manufacturing application using SPR6300

    • M. Dellagiovanna, H. Miyashita, H. Yoshioka, S. Murai, T. Nakaue, O. Takaoka, S. Kikuchi, R. Hagiwara, and S. Benard, A semi-automated AFM photomask repair process for manufacturing application using SPR6300, Photomask Technology 2007

  • A semi-automated AFM photomask repair process for manufacturing application using SPR6300

    • M. Dellagiovanna, H. Miyashita, H. Yoshioka, S. Murai, T. Nakaue, O. Takaoka, S. Kikuchi, R. Hagiwara, and S. Benard, “A semi-automated AFM photomask repair process for manufacturing application using SPR6300”, Proc. of SPIE Vol.6730, pp673021-1- pp673021-11(2007)

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2006年

  • FIBとSPMを用いたフォトマスク欠陥修正技術

    • 高岡修, FIBとSPMを用いたフォトマスク欠陥修正技術, 精密工学会超精密位置決め専門委員会定例会

  • Advanced Photomask Repair Technology for 65nm Lithography (6)

    • F. Aramaki, T. Kozakai, M. Muramatsu, Y. Sugiyama, Y. Koyama, O. Matsuda, K. Suzuki, M. Okabe, T. Doi, R. Hagiwara, T. Adachi, A. Yasaka, Y. Tanaka, O. Suga, N. Nishida, and Y. Usui, Advanced Photomask Repair Technology for 65nm Lithography (6), Photomask Technology 2006

  • Advanced Photomask Repair Technology for 65nm Lithography (5)

    • F. Aramaki, T. Kozakai, M. Muramatsu, Y. Sugiyama, Y. Koyama, O. Matsuda, K. Suzuki, M. Okabe, T. Doi, R. Hagiwara, T. Adachi, A. Yasaka, Y. Tanaka, O. Suga, N. Nishida, and Y. Usui, Advanced Photomask Repair Technology for 65nm Lithography (5), Photomask Japan 2006

  • Advanced Photomask Repair Technology for 65nm Lithography (5)

    • F. Aramaki, T. Kozakai, M. Muramatsu, Y. Sugiyama, Y. Koyama, O. Matsuda, K. Suzuki, M. Okabe, T. Doi, R. Hagiwara, T. Adachi, A. Yasaka, Y. Tanaka, O. Suga, N. Nishida, and Y. Usui, “Advanced Photomask Repair Technology for 65nm Lithography (5)”, Proc. of SPIE, Vol.6283, pp628310-1-628310-8(2006)

  • Advanced Photomask Repair Technology for 65nm Lithography (6)

    • F. Aramaki, T. Kozakai, M. Muramatsu, Y. Sugiyama, Y. Koyama, O. Matsuda, K. Suzuki, M. Okabe, T. Doi, R. Hagiwara, T. Adachi, A. Yasaka, Y. Tanaka, O. Suga, N. Nishida, and Y. Usui, “Advanced Photomask Repair Technology for 65nm Lithography (6)”, Proc. of SPIE, Vol.6349, pp63491E-1-63491E-7(2006)

  • FIBとSPMを用いたフォトマスク欠陥修正技術

    • 高岡修, “FIBとSPMを用いたフォトマスク欠陥修正技術”, 超精密位置決め専門委員会定例会講演前刷集, No.2006-2, pp11-18(2006)

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2005年

  • Advanced Photomask Repair Technology for 65nm Lithography (4)

    • Y. Itou, Y. Tanaka, O. Suga, Y. Sugiyama, R. Hagiwara, H. Takahashi, O. Takaoka, T. Kozakai, O. Matsuda, K. Suzuki, M. Okabe, S. Kikuchi, A. Uemoto, A. Yasaka, T. Adachi, and N. Nishida, Advanced Photomask Repair Technology for 65nm Lithography (4), 25th Annual BACUS Symposium

  • Advanced Photomask Repair Technology for 65nm Lithography (3)

    • Y. Itou, Y. Tanaka, O. Suga, Y. Sugiyama, R. Hagiwara, H. Takahashi, O. Takaoka, T. Kozakai, O. Matsuda, K. Suzuki, M. Okabe, S. Kikuchi, A. Uemoto, A. Yasaka, T. Adachi, and N. Nishida, Advanced Photomask Repair Technology for 65nm Lithography (3), Photomask Japan 2005

  • Advanced Photomask Repair Technology for 65nm Lithography (3)

    • Y. Itou, Y. Tanaka, O. Suga, Y. Sugiyama, R. Hagiwara, H. Takahashi, O. Takaoka, T. Kozakai, O. Matsuda, K. Suzuki, M. Okabe, S. Kikuchi, A. Uemoto, A. Yasaka, T. Adachi, and N. Nishida, “Advanced Photomask Repair Technology for 65nm Lithography (3)”, Proc. of SPIE, Vol.5853, pp1000-1008(2005)

  • Advanced Photomask Repair Technology for 65nm Lithography (4)

    • Y. Itou, Y. Tanaka, O. Suga, Y. Sugiyama, R. Hagiwara, H. Takahashi, O. Takaoka, T. Kozakai, O. Matsuda, K. Suzuki, M. Okabe, S. Kikuchi, A. Uemoto, A. Yasaka, T. Adachi, and N. Nishida, “Advanced Photomask Repair Technology for 65nm Lithography (4)”, Proc. of SPIE, Vol.5992, pp59924Y-1-59924Y-8(2005)

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2004年

  • FIB Mask Repair Technology for Electron Projection Lithography

    • Y. Yamamoto, M. Hasuda, H. Suzuki, M. Sato, O. Takaoka, H. Matsumura, N. Matsumoto, K. Iwasaki, R. Hagiwara, K. Suzuki, Y. Ikku, K. Aita, T.Kaito, T. Adachi, A. Yasaka, FIB Mask Repair Technology for Electron Projection Lithography, Photomask Japan 2004

  • Advanced Photomask Repair Technology for 65nm Lithography (2)

    • Y. Itou, Y. Tanaka, N. Yoshioka, Y. Sugiyama, R. Hagiwara, H. Takahashi, O. Takaoka, T. Kozakai, O. Matsuda, K. Suzuki, M. Okabe, S. Kikuchi, A. Uemoto, A. Yasaka, T. Adachi, N. Nishida, and T. Ozawa, Advanced Photomask Repair Technology for 65nm Lithography (2), 24th Annual BACUS Symposium

  • Advanced Photomask Repair Technology for 65nm Lithography (1)

    • Y. Itou, Y. Tanaka, N. Yoshioka, Y. Sugiyama, R. Hagiwara, H. Takahashi, O. Takaoka, J. Tashiro, K. Suzuki, M. Okabe, S. Kikuchi, A. Uemoto, A. Yasaka, T. Adachi, N. Nishida, and T. Ozawa, Advanced Photomask Repair Technology for 65nm Lithography (1), Photomask Japan 2004

  • Advanced Photomask Repair Technology for 65nm Lithography (1)

    • Y. Itou, Y. Tanaka, N. Yoshioka, Y. Sugiyama, R. Hagiwara, H. Takahashi, O. Takaoka, J. Tashiro, K. Suzuki, M. Okabe, S. Kikuchi, A. Uemoto, A. Yasaka, T. Adachi, N. Nishida, and T. Ozawa, “Advanced Photomask Repair Technology for 65nm Lithography (1)”, Proc. of SPIE, Vol.5446, pp301-312(2004)

  • Advanced Photomask Repair Technology for 65nm Lithography (2)

    • Y. Itou, Y. Tanaka, N. Yoshioka, Y. Sugiyama, R. Hagiwara, H. Takahashi, O. Takaoka, T. Kozakai, O. Matsuda, K. Suzuki, M. Okabe, S. Kikuchi, A. Uemoto, A. Yasaka, T. Adachi, N. Nishida, and T. Ozawa, “Advanced Photomask Repair Technology for 65nm Lithography (2)”, Proc. of SPIE, Vol.5567, pp1132-1143(2004)

  • FIB Mask Repair Technology for Electron Projection Lithography

    • Y. Yamamoto, M. Hasuda, H. Suzuki, M. Sato, O. Takaoka, H. Matsumura, N. Matsumoto, K. Iwasaki, R. Hagiwara, K. Suzuki, Y. Ikku, K. Aita, T.Kaito, T. Adachi, A. Yasaka, “FIB Mask Repair Technology for Electron Projection Lithography”, Proc. of SPIE, Vol.5446, pp348-356(2004)

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2003年

  • Advanced Photomask Repair Technology for 90nm/ArF Lithography (3)

    • Y. Tanaka, Y. Itou, N. Yoshioka, R. Hagiwara, A.Yasaka, O. Takaoka, T. Kozakai, Y. Koyama, H. Sawaragi, Y. Sugiyama, M. Muramatsu, T. Doi, K. Suzuki, M.Okabe, M. Shinohara, O. Matsuda, K. Aita, T. Adachi, Y. Morikawa, M. Nishiguchi, Y. Satoh, and N. Hayashi, Advanced Photomask Repair Technology for 90nm/ArF Lithography (3), 23rd Annual BACUS Symposium

  • Advanced Photomask Repair Technology for 100nm/ArF Lithography (2)

    • R. Hagiwara, A. Yasaka, K. Aita, O. Takaoka, Y. Koyama, T. Kozakai, T. Doi, M. Muramatsu, K. Suzuki, Y. Sugiyama, O. Matsuda, M. Okabe, S. Shinohara, M. Hasuda, T. Adachi, Y. Morikawa, M. Nishiguchi, Y. Satoh, N. Hayashi, T. Ozawa, Y. Tanaka, and N. Yoshioka, Advanced Photomask Repair Technology for 100nm/ArF Lithography (2), Photomask Japan 2003

  • 集束イオンビームによるマスク修正技術

    • 八坂行人, 萩原良二, 高岡修, 小山喜弘, 中川良知, 荒巻文朗, 小堺智一, 松田修, 相田和男, 土井利夫, 村松正司, 鈴木勝美, 山本洋, 鈴木浩之, 篠原正至, 荷田昌克, 集束イオンビームによるマスク修正技術, NGL2003次世代リソグラフィワークショップ

  • Advanced Photomask Repair Technology for 100nm/ArF Lithography (2)

    • R. Hagiwara, A. Yasaka, K. Aita, O. Takaoka, Y. Koyama, T. Kozakai, T. Doi, M. Muramatsu, K. Suzuki, Y. Sugiyama, O. Matsuda, M. Okabe, S. Shinohara, M. Hasuda, T. Adachi, Y. Morikawa, M. Nishiguchi, Y. Satoh, N. Hayashi, T. Ozawa, Y. Tanaka, and N. Yoshioka, “Advanced Photomask Repair Technology for 100nm/ArF Lithography (2)”, Proc. of SPIE, Vol.5130, pp510-519(2003)

  • Advanced Photomask Repair Technology for 90nm/ArF Lithography (3)

    • Y. Tanaka, Y. Itou, N. Yoshioka, R. Hagiwara, A.Yasaka, O. Takaoka, T. Kozakai, Y. Koyama, H. Sawaragi, Y. Sugiyama, M. Muramatsu, T. Doi, K. Suzuki, M.Okabe, M. Shinohara, O. Matsuda, K. Aita, T. Adachi, Y. Morikawa, M. Nishiguchi, Y. Satoh, and N. Hayashi, “Advanced Photomask Repair Technology for 90nm/ArF Lithography (3)”, Proc. of SPIE, Vol.5256, pp526-537(2003)

  • 集束イオンビームによるマスク修正技術

    • 八坂行人, 萩原良二, 高岡修, 小山喜弘, 中川良知, 荒巻文朗, 小堺智一, 松田修, 相田和男, 土井利夫, 村松正司, 鈴木勝美, 山本洋, 鈴木浩之, 篠原正至, 荷田昌克, “集束イオンビームによるマスク修正技術”, NGL2003次世代リソグラフィワークショップ予稿集, pp126-128(2003)

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2002年

  • Advanced Photomask Repair Technology for 100nm/ArF Lithography

    • R. Hagiwara, A. Yasaka, K. Aita, O. Takaoka, Y. Koyama, T. Kozakai, T. Doi, M. Muramatsu, K. Suzuki, Y. Sugiyama, H. Sawaragi, M. Okabe, S. Shinohara, M. Hasuda, T. Adachi, Y. Morikawa, M. Nishiguchi, Y. Satoh, N. Hayashi, T. Ozawa, Y. Tanaka, and N. Yoshioka, Advanced Photomask Repair Technology for 100nm/ArF Lithography, 22nd Annual BACUS Symposium

  • Advanced Photomask Repair Technology for 100nm/ArF Lithography

    • R. Hagiwara, A. Yasaka, K. Aita, O. Takaoka, Y. Koyama, T. Kozakai, T. Doi, M. Muramatsu, K. Suzuki, Y. Sugiyama, H. Sawaragi, M. Okabe, S. Shinohara, M. Hasuda, T. Adachi, Y. Morikawa, M. Nishiguchi, Y. Satoh, N. Hayashi, T. Ozawa, Y. Tanaka, and N. Yoshioka, “Advanced Photomask Repair Technology for 100nm/ArF Lithography ”, Proc. of SPIE, Vol.4889, pp1056-1064(2002)

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2001年

  • Advanced FIB mask repair technology in ArF lithography 3

    • R.Hagiwara, A.Yasaka, O.Takaoka, T.Kozakai, S.Yabe, Y.Koyama, M.Muramatsu, T.Doi, K.Suzuki, M.Okabe, K.Aita, T.Adachi, s.Kubo, N.Yoshioka, H.Morimoto, Y.Morikawa, K.Iwase, N.Hayashi, Advanced FIB mask repair technology in ArF lithography 3, Photomask Japan 2001

  • Advanced Photomask Repair Technology for ArF Lithography (2)

    • S. Kubo, K. Hiruta, H. Morimoto, A. Yasaka, R. Hagiwara, T. Adachi, Y. Morikawa, K. Iwase and N. Hayashi, “Advanced Photomask Repair Technology for ArF Lithography (2)”, Proc. of SPIE, Vol.4186, pp158-164(2001)

  • Advanced Photomask Repair Technology for ArF Lithography (3)

    • R. Hagiwara, A. Yasaka, O. Takaoka, T. Kozakai, S. Yabe, Y. Koyama, M. Muramatsu, T. Doi, K. Suzuki, M . Okabe, K. Aita, T. Adachi, S. Kubo, N. Yoshioka, H. Morimoto, Y. Morikawa, K. Iwase, and N. Hayashi, “Advanced Photomask Repair Technology for ArF Lithography (3)”, Proc. of SPIE, Vol.4409, pp555-562(2001)

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2000年

  • Advanced FIB mask repair technology in ArF lithography 2

    • S.Kubo, K.Hiruta, H.Morimoto, A.Yasaka, R.Hagiwara, T.Adachi, Y.Morikawa, K.Iwase, N.Hayashi, Advanced FIB mask repair technology in ArF lithography 2, 20th BACUS symposium

  • Advanced FIB mask repair technology in ArF lithography

    • K.Hiruta, S.Kubo, H.Morimoto, A.Yasaka, R.Hagiwara, T.Adachi, Y.Morikawa, K.Iwase, N.Hayashi, Advanced FIB mask repair technology in ArF lithography, Photomask Japan 2000

  • Advanced Photomask Repair Technology for ArF Lithography

    • K. Hiruta, S. Kubo, H. Morimoto, A. Yasaka, R. Hagiwara, T. Adachi, Y. Morikawa, K. Iwase and N. Hayashi, “Advanced Photomask Repair Technology for ArF Lithography”, Proc. of SPIE, Vol.4066, pp522-530(2000)

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1999年

  • FIB mask repair technology

    • A.Yasaka, FIB mask repair technology, SEMI Technology Symposium '99

  • Development of focused ion-beam repair for opaque defects on MoSi-based attenuated phase-shift mask

    • Nishida, Naoki; Nishio, Yasuyuki; Kinoshita, Hiroshi; Takaoka, Osamu; Kozakai, Tomokazu; Aita, Kazuo, Development of focused ion-beam repair for opaque defects on MoSi-based attenuated phase-shift mask, Photomask Japan 99

  • Development of focused-ion beam repair for opaque defects on MoSi-based attenuated phase-shift mask

    • N. Nishida, Y. Nishio, H. Kinoshita, O. Takaoka, T. Kozakai, and K. Aita, “Development of focused-ion beam repair for opaque defects on MoSi-based attenuated phase-shift mask”, Proc. of SPIE, Vol.3748, pp599-608(1999)

  • FIB mask repair technology

    • A. yasaka, “FIB mask repair technology”, SEMI Technology Symposium '99, pp3-70 (1999)

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1998年

  • FIB mask repair for MoSi-based PSMs

    • T.Adachi, O.Takaoka, K.Aita, A.Yasaka, FIB mask repair for MoSi-based PSMs, High-throughput Charged-particle lithography workshop, 98

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1997年

  • Recent topics in FIB mask repair

    • A. Yasaka, Recent topics in FIB mask repair, High-throughput Charged-particle lithography workshop, 97

  • Repair system for future mask fabrication

    • A. Yasaka, Repair system for future mask fabrication, 3rd symposium on 193nm lithography

  • Advanced photomask reconstruction with the Seiko SIR 3000

    • S. Ruatta, E. Smith, A. Yasaka, Advanced photomask reconstruction with the Seiko SIR 3000, 17th BACUS symposium

  • 『集束イオンビーム装置』

    • 岩崎、杉山、小山、八坂、足立、『集束イオンビーム装置』、1998年版電子材料別冊超LSI製造試験装置ガイドブック p.197(1997)

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1996年

  • Recent progress in repair accuracy of the focused ion-beam mask repair system

    • Aita, Kazuo; Yasaka, Anto; Kitamura, Tadashi; Matsumura, Hiroshi; Satoh, Yasushi, Nakamura, Hiroshi, Fujikawa, Junji; Tsuchiya, Katsuhide, Noguchi, Shigeru, Recent progress in repair accuracy of the focused ion-beam mask repair system, Photomask Japan 96

  • Performance of gas-assisted FIB repair for opaque defects

    • Yasushi Satoh, Hiroshi Nakamura,Junji Fujikawa, Katsuhide Tsuchiya, Shigeru Noguchi, Kazuo Aita, Anto Yasaka, Performance of gas-assisted FIB repair for opaque defects, 16th BACUS symposium

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1995年

  • New technique for repairing opaque defects

    • Aita, Kazuo; Koyama, Yoshihiro; Matsumura, Hiroshi; Kaito, Takashi; Satoh, Yasushi; Tsuchiya, Katsuhide; Noguchi, Shigeru, New technique for repairing opaque defects, Photomask Japan 95

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1991年

  • 『集束イオンビーム装置』

    • 八坂、皆藤、足立、『集束イオンビーム装置』、1992年版電子材料別冊超LSI製造試験装置ガイドブック p.87(1991)

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1990年

  • Experimental study on the influence of liquid metal ion source energy distribution on focused ion beam induced deposition

    • A.Yasaka, T.Yamaoka, T.Kaito, T.Adachi, Experimental study on the influence of liquid metal ion source energy distribution on focused ion beam induced deposition, Second Japan-US Seminar on Focused ion Beams and Applications

  • Ga液体金属イオン源のエネルギー分布のヒーターパワー依存性

    • 山岡、八坂, Ga液体金属イオン源のエネルギー分布のヒーターパワー依存性, 90年秋季応用物理学会学術講演会

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1987年

  • Recent progress on etching technology with focused ion beam in photomask repair

    • Y.Nakagawa, S.Sasaki, M.Sato, J.Glanville, M.Yamamoto, Recent progress on etching technology with focused ion beam in photomask repair, Japan-US Seminar on Focused Ion Beam Technology and Applications

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1986年

  • Submicron mask repair using focused ion beam technology

    • M.Yamamoto, M.Sato, H.kyogoku, K.Aita, Y.Nakagawa, A.Yasaka, R.Takasawa, O.Hattori, Submicron mask repair using focused ion beam technology, SPIE, Electron-Beam, X-ray, & Ion-Beam Techniques for submicronmeter lithographies V

  • Submicron mask repair using focused ion beam technology

    • M.Yamamoto, M.Sato, H.kyogoku, K.Aita, Y.Nakagawa, A.Yasaka, R.Takasawa, O.Hattori, Submicron mask repair using focused ion beam technology, 17th理研シンポジウム　Ion implantation and Submicron Fabrication

  • 『SIR-1000フォトマスクリペア装置』

    • 山本、『SIR-1000フォトマスクリペア装置』、月刊Semiconductor World 1月号 p.97(1986)

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1985年

  • Mask repair using focused ion beam

    • Takashi Kaito and Masahiro Yamamoto, Mask repair using focused ion beam, 9th Symposium on Ion Source and Ion-Assisted Technology(ISIAT 85)

  • Mask repair using focused ion beam

    • Takashi Kaito and Masahiro Yamamoto, Mask repair using focused ion beam, 9th Symposium on Ion Source and Ion-Assisted Technology(ISIAT 85)

  • 『集束イオンビーム装置』

    • 相田、佐藤、山本、『集束イオンビーム装置』、1986年版電子材料別冊LSI製造試験装置ガイドブック p.115(1985)

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1984年

  • 集束イオンビームCVDによるカーボン膜パターンの形成

    • 皆藤、中川、佐藤、山本, 集束イオンビームCVDによるカーボン膜パターンの形成, 84年第45回秋期応用物理学会学術講演会

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