Photomask Repair System MR8000
This FPD photomask defect repair system uses focused ion beam (FIB) technology and supports large scale photomasks.
A rotation mechanism inside the chamber minimizes an installation area.
Features
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Supports large flat panel dispray masks
Can take large photomasks up to a maximum size of 1400×1600 mm. -
Can deposit high adhesion film Can form film
with adhesion strength comparable to Cr film on the mask using a special gas. -
Can repair gray tone masks
FIB carbon deposition function allows repair of clear defects in gray-tone masks that use half-tone films.
Specifications
Mask sizes | Max: 1400×1600 mm Min: 6-inch Max thickness: 15 mm Min thickness: 5 mm |
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Repair accuracy | 50 nm@3σ |
Clear defect repair method | FIB carbon deposition |
Opaque defect repair method | Gas-assisted etching |