Advanced CD Measurement SEM CG7300
Features
- Realized a wide variety of enhanced and reliable metrology for semiconductor mass production in the EUV Lithography era.
- Achieved high reliable process control by minimizing machine differences error down to the atomic size level. (Improved to enhance tool-to-tool matching performance by around 10% compared to the previous model.)
- Clear and high-resolution images are realized by improving environmental resistance and anti-charging high-speed scanning.
- Applicable to a wide range of metrology needs from high-precision CD to CD Uniformity by improved scanning performance.
- Contributes to productivity and CoO (Cost of Owner ship) improvement by increasing throughput and improving Edge Exclusion