High-Precision Electron Beam Metrology System GT2000
![High-Precision Electron Beam Metrology System GT2000](/global/en/media/image01_tcm27-224296.png)
CD-SEM to meet the needs of semiconductor devices development and mass production in High-NA EUV generation
Features
- 100V ultra-low accceleration voltage and ultra-high-speed multi-point measurement functionality for High-NA EUV processes
- High-sensitivity detection system for 3D device structures
- New platforms and new electronic optical systems to improve tool-to-tool CD matching
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Resist shrink evaluation results and each condition SEM images